DocumentCode :
2996589
Title :
Analytical study of drift velocity in N-type silicon nanowires
Author :
Fallahpour, Amir Hossein ; Ahmadi, Mohammad Taghi ; Ismail, Razali
Author_Institution :
Fac. of Electr. Eng., Univ. Teknol. Malaysia, Skudai, Malaysia
fYear :
2009
fDate :
15-16 July 2009
Firstpage :
252
Lastpage :
254
Abstract :
The limitations on carrier drift velocity due to high-field effect and randomly velocity vector in equilibrium is reported. The results are based on asymmetrical distribution function that converts randomness velocity vectors in zero-field to streamlined one in a very high electric field. The ultimate drift velocity is found to be appropriate thermal velocity for a given dimensionality for non-degenerately doped silicon nanowires. However, the ultimate drift velocity is the Fermi velocity for degenerately doped silicon nanowires. Other important parameter in carrier transport phenomena, for nanoscale devices is quantum confinement effect that leads to one-dimensional behavior in silicon nanowire.
Keywords :
ULSI; elemental semiconductors; integrated circuit design; nanotechnology; nanowires; silicon; Fermi velocity; N-type silicon nanowires; Si; ULSI; asymmetrical distribution function; carrier drift velocity; carrier transport phenomena; high electric field; high-field effect; nanoscale devices; quantum confinement effect; random velocity vector; thermal velocity; ultimate drift velocity; ultra-large-scale-integration; Charge carrier processes; Circuits; Distribution functions; Electron mobility; Gallium arsenide; Nanoscale devices; Nanowires; Potential well; Silicon; Ultra large scale integration; Silicon nanowire; degenerate limit; drift velocity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quality Electronic Design, 2009. ASQED 2009. 1st Asia Symposium on
Conference_Location :
Kuala Lumpur
Print_ISBN :
978-1-4244-4952-1
Electronic_ISBN :
978-1-4244-4952-1
Type :
conf
DOI :
10.1109/ASQED.2009.5206261
Filename :
5206261
Link To Document :
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