DocumentCode :
2997495
Title :
A high speed subthreshold SRAM cell design
Author :
Ahmadimehr, Amir-Reza ; Ebrahimi, Behzad ; Afzali-Kusha, Ali
Author_Institution :
Nanoelectron. Center of Excellence, Univ. of Tehran, Tehran, Iran
fYear :
2009
fDate :
15-16 July 2009
Firstpage :
9
Lastpage :
13
Abstract :
In this paper, we propose a subthreshold SRAM cell structure which can be read differentially. The main advantage of the cell is its high read current while the static noise margin and power consumption are reasonable. The cell is suitable for high performance applications where the speed is of prime concern. To assess the efficiency of the proposed cell, we compare its characteristics to three subthreshold SRAM cell structures recently introduced in the literature. The cells are implemented in both the bulk and SOI-FinFET technologies at the node of 32 nm.
Keywords :
MOSFET; SRAM chips; high-speed integrated circuits; integrated circuit design; nanoelectronics; silicon-on-insulator; SOI-FinFET technology; bulk FinFET technology; high speed subthreshold SRAM cell design; power consumption; size 32 nm; static noise margin; Design engineering; Digital circuits; Energy consumption; FinFETs; Nanoelectronics; Power engineering and energy; Power engineering computing; Random access memory; Robustness; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quality Electronic Design, 2009. ASQED 2009. 1st Asia Symposium on
Conference_Location :
Kuala Lumpur
Print_ISBN :
978-1-4244-4952-1
Electronic_ISBN :
978-1-4244-4952-1
Type :
conf
DOI :
10.1109/ASQED.2009.5206306
Filename :
5206306
Link To Document :
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