DocumentCode :
2997563
Title :
Analytical modeling of potential distribution in trigate SOI MOSFETs
Author :
Ghanatian, Hamdam ; Hosseini, Seyed Ebrahim
Author_Institution :
Electr. Eng. Dept., Ferdowsi Univ. of Mashhad, Mashhad, Iran
fYear :
2015
fDate :
10-14 May 2015
Firstpage :
1240
Lastpage :
1244
Abstract :
In this paper a new 3-D analytical model for the potential distribution in nano-scaled lightly doped trigate silicon on insulator MOSFETs in the subthreshold regime, is proposed. This model is derived by solving 3-D Poisson´s equation and using parabolic potential distribution assumption between lateral gates. The proposed analytic model is investigated and compared with the obtained results from 3-D simulations using ATLAS device simulator. It is demonstrated that analytic solution has a good accuracy to predict potential distribution along the silicon body.
Keywords :
MOSFET; Poisson equation; semiconductor device models; silicon-on-insulator; 3D Poisson´s equation; 3D analytical model; 3D simulations; ATLAS device simulator; lateral gates; nano-scaled lightly doped trigate silicon on insulator MOSFET; parabolic potential distribution assumption; subthreshold regime; trigate SOI MOSFET; Conferences; Decision support systems; Electrical engineering; Silicon; 3-D Poissons equation; analitical model; parabolic potential distribution; trigate SOI MOSFET;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Engineering (ICEE), 2015 23rd Iranian Conference on
Conference_Location :
Tehran
Print_ISBN :
978-1-4799-1971-0
Type :
conf
DOI :
10.1109/IranianCEE.2015.7146405
Filename :
7146405
Link To Document :
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