• DocumentCode
    2998617
  • Title

    Session 4 - Process Technology Fully-Silicided (FUSI) Gates

  • fYear
    2004
  • fDate
    13-15 Dec. 2004
  • Firstpage
    77
  • Lastpage
    77
  • Abstract
    Summary form only given. Start of the above-titled section of the conference proceedings record.
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    0-7803-8684-1
  • Type

    conf

  • DOI
    10.1109/IEDM.2004.1419069
  • Filename
    1419069
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2998617