DocumentCode :
2998878
Title :
Influence of nitrogen in ultra-thin SiON on negative bias temperature instability under AC stress
Author :
Mitani, Yuichiro
Author_Institution :
Adv. LSI Technol. Lab., Toshiba Corp., Yokohama, Japan
fYear :
2004
fDate :
13-15 Dec. 2004
Firstpage :
117
Lastpage :
120
Abstract :
In order to clarify the effect of nitrogen incorporation on negative bias temperature instability (NBTI), VTH degradations and its recoveries for NO-SiON and N-plasma SiON has been investigated. As a result, recovery of NBT degradation is more difficult for N-plasma SiON than for NO-SiON. This result indicates that nitrogen atoms have an effect on the "lock-in" of hydrogen or hydrogen-related species. Furthermore, on the basis of the analysis of ΔVTH under DC stress, we also tried to predict the NBT degradation under AC stress.
Keywords :
integrated circuit reliability; nitridation; silicon compounds; stress effects; AC stress; N-plasma SiON; NBT degradation; SiON; hydrogen-related species; negative bias temperature instability; nitrogen atoms; nitrogen incorporation; ultra-thin SiON; Degradation; Hydrogen; Large scale integration; Negative bias temperature instability; Niobium compounds; Nitrogen; Plasma devices; Plasma simulation; Stress; Titanium compounds;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International
Print_ISBN :
0-7803-8684-1
Type :
conf
DOI :
10.1109/IEDM.2004.1419082
Filename :
1419082
Link To Document :
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