DocumentCode
3000042
Title
Production and loss processes of high-energy oxygen negative ions in a DC magnetron plasma
Author
Toyoda, Hajime ; Takahashi, Satoshi ; Ichihara, K. ; Ohkubo, Masataka ; Suga, H.
Author_Institution
Dept. of Electr. Eng., Nagoya Univ., Japan
fYear
1996
fDate
3-5 June 1996
Firstpage
184
Abstract
Summary form only given. Magnetron plasmas are commonly used in the deposition of electrically conductive and optically transparent ITO films (Indium Tin-Oxide) or other oxide materials. However, high-energy negative ions originating from a cathode sometimes degrade the properties of the deposited films. To understand the behavior of such ions in a DC magnetron oxygen plasma, the energy distributions of oxygen negative ions are measured with spatial resolution.
Keywords
sputter deposition; DC magnetron plasma; ITO; ITO films; InSnO; O; cathode; degradation; deposition; electrically conductive films; energy distributions; high-energy negative ions; magnetron plasmas; optically transparent films; oxide materials; spatial resolution; Conductive films; Indium tin oxide; Magnetic materials; Optical films; Optical losses; Particle beam optics; Plasma materials processing; Plasma measurements; Plasma properties; Production;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location
Boston, MA, USA
ISSN
0730-9244
Print_ISBN
0-7803-3322-5
Type
conf
DOI
10.1109/PLASMA.1996.550820
Filename
550820
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