Title :
High resolution Laplace Deep Level Transient Spectroscopy studies of shallow and deep levels in n-GaN
Author :
Emiroglu, D. ; Evans-Freeman, J. ; Kappers, M.J. ; McAleese, C. ; Humphreys, C.J.
Author_Institution :
Mater. & Eng. Res. Inst., Sheffield Hallam Univ., Sheffield
fDate :
July 28 2008-Aug. 1 2008
Abstract :
Deep Level Transient Spectroscopy (DLTS) and high resolution Laplace DLTS (LDLTS) have been used to distinguish the difference between electrically active point and extended defects in MOVPE-grown n-type GaN. Three dominant features are observed in the conventional DLTS spectrum, with energies in the region of 40 meV, 550 meV and 1.46 eV. However, detailed examination with LDLTS shows that all these peaks consist of multiple emission rates. The low energy feature consists of three point defects closely spaced in energy, which are identified as ON, and SiGa. The feature at around 550 meV is shown to be due to defects in the strain field of a dislocation, which is deduced because the activation energy is dependent upon DLTS fill pulse length. LDLTS of this peak shows a very complicated spectrum, also indicative of a system of defects in a dislocation strain field. When applied to the very deep level of 1.46 eV, LDLTS shows multiple emission rates but they behave as point-defect like states.
Keywords :
III-V semiconductors; deep level transient spectroscopy; deep levels; dislocations; electron traps; extended defects; gallium compounds; point defects; semiconductor epitaxial layers; wide band gap semiconductors; GaN:Si,O; MOVPE; activation energy; deep levels; dislocation strain field; electron traps; high resolution Laplace DLTS; high resolution Laplace deep level transient spectroscopy; multiple emission rates; point defects; shallow levels; Bars; Capacitive sensors; Electrons; Epitaxial growth; Gallium nitride; Inorganic materials; Materials science and technology; Photonic band gap; Spectroscopy; Substrates; DLTS; GaN; Laplace DLTS; defects; dislocations;
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2008. COMMAD 2008. Conference on
Conference_Location :
Sydney, SA
Print_ISBN :
978-1-4244-2716-1
Electronic_ISBN :
1097-2137
DOI :
10.1109/COMMAD.2008.4802085