Title :
A study of the properties of RF sputtered MgXZn1-XO thin films
Author :
Lei, Yu ; Li, Zhao ; Yi-min, Cui ; Zhi-yong, Zhang
Author_Institution :
Dept. of Phys., Beihang Univ., Beijing
fDate :
July 28 2008-Aug. 1 2008
Abstract :
MgXZn1-XO, a ZnO-based ternary compound, has been recognized as a promising material to be used in UV light emitting devices, UV laser diodes and UV detectors. In this paper, a batch of MgxZn1-xO films were fabricated using radio frequency sputtering on glass substrates with a Mg0.32Zn0.68O target. Then the structure and the optical properties of these films after being treated at different annealing temperatures were studied.
Keywords :
II-VI semiconductors; annealing; magnesium compounds; semiconductor growth; semiconductor thin films; sputter deposition; zinc compounds; MgXZn1-XO; RF sputtered thin films; SiO2; UV detectors; UV laser diodes; UV light emitting devices; annealing temperatures; glass substrates; optical properties; radio frequency sputtering; structural properties; Annealing; Glass; Optical films; Optical materials; Radio frequency; Sputtering; Substrates; Temperature; X-ray diffraction; Zinc oxide; MgxZn1-xO; RF sputtered; annealing; thin films;
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2008. COMMAD 2008. Conference on
Conference_Location :
Sydney, SA
Print_ISBN :
978-1-4244-2716-1
Electronic_ISBN :
1097-2137
DOI :
10.1109/COMMAD.2008.4802087
