DocumentCode :
3001071
Title :
Modeling of accumulation MOS capacitors for analog design in digital VLSI processes
Author :
Pavan, Shanthi ; Tsividis, Yannis ; Nagaraj, Krishnaswamy
Author_Institution :
Texas Instrum., Warren, NJ, USA
Volume :
6
fYear :
1999
fDate :
36342
Firstpage :
202
Abstract :
In this paper, we present an explicit model for the MOS capacitor in accumulation and compare it with device simulation and measurement results. The model is physics based and tracks substrate doping concentration and temperature, and incorporates the polysilicon gate depletion effect. Harmonic distortion generated when the proposed model is used in circuit simulation agrees with that obtained by using a very closely spaced piecewise linear model generated by device simulation
Keywords :
CMOS integrated circuits; MOS capacitors; circuit simulation; integrated circuit design; integrated circuit modelling; mixed analogue-digital integrated circuits; piecewise linear techniques; accumulation MOS capacitors; analog design; circuit simulation; device simulation; digital VLSI processes; explicit model; harmonic distortion; it with device simulation and measurement results. The model is p; physics based model; polysilicon gate depletion effect; substrate doping concentration; very closely spaced piecewise linear model; CMOS process; CMOS technology; Capacitance; Circuit simulation; Doping; MOS capacitors; Semiconductor device modeling; Semiconductor process modeling; Very large scale integration; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems, 1999. ISCAS '99. Proceedings of the 1999 IEEE International Symposium on
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-5471-0
Type :
conf
DOI :
10.1109/ISCAS.1999.780130
Filename :
780130
Link To Document :
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