DocumentCode :
3001582
Title :
An analysis: traditional semiconductor lithography versus emerging technology (nano imprint)
Author :
Trybula, Walt ; Wright, Robert L. ; Adusumilli, Kranthi Mitra ; Goodall, Randy K.
Author_Institution :
SEMATECH, Austin, TX, USA
fYear :
2005
fDate :
4-7 Dec. 2005
Abstract :
The introduction of emerging technologies into existing manufacturing facilities is not necessarily encouraged by the people responsible for the output of the facilities. Any "new" technology carries risks and people responsible for delivering manufactured products are, by nature, risk-adverse. This paper demonstrates the advantage of evaluating the impact of attempting to introduce a new technology into an existing facility before actually attempting the introduction. The first part of the analysis examines the impact on the total product delivery for a comparable volume of two facilities, one with the traditional processes and one with the new process replacing existing ones. Based on these results, a conclusion can be reached if there are sufficient benefits to consider pursuing the development and introduction of the new techniques. An example is employed that evaluates the introduction of nano-imprint.
Keywords :
lithography; semiconductor technology; nano imprint; semiconductor lithography; Acceleration; Electronics industry; Lithography; Manufactured products; Moore´s Law; Optical devices; Physics; Production facilities; Transistors; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation Conference, 2005 Proceedings of the Winter
Print_ISBN :
0-7803-9519-0
Type :
conf
DOI :
10.1109/WSC.2005.1574509
Filename :
1574509
Link To Document :
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