DocumentCode :
3001933
Title :
Schottky barrier enhancement on n-InP solar cell applications
Author :
Clausen, Thomas ; Leistiko, Otto
Author_Institution :
Dept. of Phys., Tech. Univ. Denmark, Lyngby, Denmark
Volume :
2
fYear :
1994
fDate :
5-9 Dec 1994
Firstpage :
1807
Abstract :
It is demonstrated that the Schottky barrier height on n-type InP can be enhanced to values close to the energy bandgap (1.35 eV) by employing a AuZnCr metallization. The process is simple and requires only mild and fast annealing sequences with temperatures not exceeding 500°C. Also, no critical epitaxial growth step of junctions is needed, making the process fairly cheap. Thus, prospects for an efficient and simple solar cell device structure for space application purposes based on highly radiant-resistant InP are greatly improved
Keywords :
III-V semiconductors; Schottky barriers; Schottky diodes; annealing; indium compounds; semiconductor device metallisation; semiconductor device testing; solar cells; 1.35 eV; AuZnCr; InP; Schottky barrier enhancement; annealing sequences; application; energy bandgap; epitaxial growth; metallization; n-InP solar cell; Annealing; Contacts; Indium phosphide; Metallization; Photonic band gap; Photovoltaic cells; Schottky barriers; Schottky diodes; Temperature; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Energy Conversion, 1994., Conference Record of the Twenty Fourth. IEEE Photovoltaic Specialists Conference - 1994, 1994 IEEE First World Conference on
Conference_Location :
Waikoloa, HI
Print_ISBN :
0-7803-1460-3
Type :
conf
DOI :
10.1109/WCPEC.1994.520654
Filename :
520654
Link To Document :
بازگشت