Title :
Current profile control and fluctuation reduction in MST via electrostatic current injection
Author :
Craig, D. ; Almagri, A.F. ; Fiksel, G. ; Kendrick, R. ; Lovell, T.W. ; Oliva, S. ; Prager, S.C. ; Sarff, J.S. ; Thomas, M.A.
Author_Institution :
Dept. of Phys., Wisconsin Univ., Madison, WI, USA
Abstract :
Summary form only given, as follows. We have designed and are conducting a current profile control experiment aimed at reducing fluctuations and improving confinement in RFP plasmas. Profile modification will be achieved via electrostatic injection of electrons from /spl sim/30 miniature plasma sources. Each source produces a 1 kA electron beam which is dense (/spl sim/150 kA/cm/sup 2/ at 70 cm from the source), highly directional, and without large impurity content. An initial multi-injector experiment in which a total current of 5 kA was injected is completed. Results from this experiment will be discussed. One of the promising results is an apparent increase in the plasma density by 50% and associated increase in the particle confinement time. Low impurity influx from the sources is essential for scaling up the injection system. MHD computations predict a current of /spl sim/30 kA is necessary to suppress fluctuations in Madison Symmetric Torus (MST) and future experiments will employ an increasing number of injectors until this level is reached.
Keywords :
plasma toroidal confinement; 1 kA; 30 kA; 5 kA; MHD computations; MST; Madison Symmetric Torus; RFP plasmas; confinement; current profile control; electrostatic current injection; fluctuation reduction; impurity influx; multi-injector experiment; particle confinement time; plasma density; profile modification; Electrostatics; Fluctuations; Impurities; Plasma confinement; Plasma density; Plasma sheaths; Plasma sources; Radio frequency; Toroidal magnetic fields; US Department of Energy;
Conference_Titel :
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-3322-5
DOI :
10.1109/PLASMA.1996.550834