DocumentCode
3003091
Title
Ground State Lasing at 1.34 μm from InAs Quantum Dots Grown on GaAs Substrate by Antimony-Mediated Metal Organic Chemical Vapor Deposition
Author
Guimard, D. ; Ishida, M. ; Nishioka, M. ; Tsukamoto, S. ; Hatori, N. ; Sudo, H. ; Yamamoto, T. ; Nakata, Y. ; Ebe, H. ; Sugawara, M. ; Arakawa, Y.
Author_Institution
Univ. of Tokyo, Tokyo
fYear
2007
fDate
6-11 May 2007
Firstpage
1
Lastpage
2
Abstract
Ground state lasing above 1.30 mum (1.34 mum) was obtained for the first time from InAs quantum dots grown on GaAs substrate by metal organic chemical vapor deposition.
Keywords
III-V semiconductors; MOCVD; ground states; indium compounds; quantum dot lasers; GaAs; InAs; antimony-mediated metal organic chemical vapor deposition; ground state lasing; quantum dots; wavelength 1.34 mum; Chemical lasers; Chemical vapor deposition; Gallium arsenide; Laser stability; Organic chemicals; Quantum dot lasers; Quantum dots; Quantum mechanics; Stationary state; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-55752-834-6
Type
conf
DOI
10.1109/CLEO.2007.4452487
Filename
4452487
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