DocumentCode :
3003320
Title :
Modulation of drain current by redox-active molecules incorporated in Si MOSFETs
Author :
Gowda, Srivardhan ; Mathur, Guru ; Li, Qiliang ; Surthi, Shyam ; Zhao, Qian ; Lindsey, Jonathan S. ; Bocian, David F. ; Misra, Veena
Author_Institution :
Dept. of Electr. & Comput. Eng., North Carolina State Univ., Raleigh, NC, USA
fYear :
2004
fDate :
13-15 Dec. 2004
Firstpage :
707
Lastpage :
710
Abstract :
Redox-active molecular monolayers were incorporated in MOSFETs to modulate the device characteristics. The discrete molecular states were manifested in the drain current characteristics indicating the presence of distinct energy levels at room temperature.
Keywords :
MOSFET; molecular electronics; MOSFET; discrete molecular states; drain current; molecular monolayers; redox-active molecules; CMOS technology; Chemical technology; Chemistry; Electrons; Energy states; Low voltage; MOSFETs; Oxidation; Performance analysis; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International
Print_ISBN :
0-7803-8684-1
Type :
conf
DOI :
10.1109/IEDM.2004.1419267
Filename :
1419267
Link To Document :
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