• DocumentCode
    3003575
  • Title

    Capacitance modeling of laterally non-uniform MOS devices

  • Author

    Aarts, A.C.T. ; van der Hout, R. ; Paasschens, J.C.J. ; Scholten, A.J. ; Willemsen, M. ; Klaassen, D.B.M.

  • Author_Institution
    Philips Res. Labs., Eindhoven, Netherlands
  • fYear
    2004
  • fDate
    13-15 Dec. 2004
  • Firstpage
    751
  • Lastpage
    754
  • Abstract
    In compact transistor modeling for circuit simulation, the capacitances of conventional MOS devices are commonly determined as the derivatives of terminal charges, which on their turn are obtained from the so-called Ward-Dutton charge partitioning scheme (Ward, 1981). For devices with a laterally non-uniform channel doping profile, however, it is shown in this paper that: 1) no terminal charges exist for the description of capacitances. Instead, 2) a model is presented for the capacitances of such devices, including numerical results for a MOS transistor with a laterally diffused channel doping profile. Finally, 3) a method is given to incorporate such a capacitance model in circuit simulators which are traditionally based on terminal charge models.
  • Keywords
    MOSFET; capacitance; circuit simulation; doping profiles; semiconductor device models; MOS transistor; Ward-Dutton charge partitioning scheme; capacitance modeling; circuit simulation; compact transistor modeling; laterally diffused channel doping profile; laterally nonuniform MOS devices; laterally nonuniform channel doping profile; terminal charges; Capacitance; Circuit simulation; Circuit testing; Doping profiles; Laboratories; MOS devices; MOSFETs; Power supplies; Semiconductor process modeling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International
  • Print_ISBN
    0-7803-8684-1
  • Type

    conf

  • DOI
    10.1109/IEDM.2004.1419281
  • Filename
    1419281