DocumentCode
3003575
Title
Capacitance modeling of laterally non-uniform MOS devices
Author
Aarts, A.C.T. ; van der Hout, R. ; Paasschens, J.C.J. ; Scholten, A.J. ; Willemsen, M. ; Klaassen, D.B.M.
Author_Institution
Philips Res. Labs., Eindhoven, Netherlands
fYear
2004
fDate
13-15 Dec. 2004
Firstpage
751
Lastpage
754
Abstract
In compact transistor modeling for circuit simulation, the capacitances of conventional MOS devices are commonly determined as the derivatives of terminal charges, which on their turn are obtained from the so-called Ward-Dutton charge partitioning scheme (Ward, 1981). For devices with a laterally non-uniform channel doping profile, however, it is shown in this paper that: 1) no terminal charges exist for the description of capacitances. Instead, 2) a model is presented for the capacitances of such devices, including numerical results for a MOS transistor with a laterally diffused channel doping profile. Finally, 3) a method is given to incorporate such a capacitance model in circuit simulators which are traditionally based on terminal charge models.
Keywords
MOSFET; capacitance; circuit simulation; doping profiles; semiconductor device models; MOS transistor; Ward-Dutton charge partitioning scheme; capacitance modeling; circuit simulation; compact transistor modeling; laterally diffused channel doping profile; laterally nonuniform MOS devices; laterally nonuniform channel doping profile; terminal charges; Capacitance; Circuit simulation; Circuit testing; Doping profiles; Laboratories; MOS devices; MOSFETs; Power supplies; Semiconductor process modeling; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International
Print_ISBN
0-7803-8684-1
Type
conf
DOI
10.1109/IEDM.2004.1419281
Filename
1419281
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