DocumentCode
3003952
Title
Self-consistent electro-thermo-mechanical analysis of AlN passivation effect on AlGaN/GaN HEMTs
Author
Prabowo, Briliant Adhi ; Anumeha ; Prakash, Abijith ; Kumar, Raunak ; Sheu, Gene ; Tsai, Jung-Ruey ; Yang, Shao-Ming
Author_Institution
Dept. of Comput. Sci. & Inf. Eng., Asia Univ., Taichung, Taiwan
fYear
2011
fDate
21-24 Nov. 2011
Firstpage
1356
Lastpage
1360
Abstract
In this article, the effect of AlN materials as passivation over AlGaN layer on AlGaN/GaN HEMTs performance was investigated firstly using electro-thermo-mechanical coupled methodology by both TCAD simulation and analytic calculation. It suggested that AlN passivation layer over AlGaN layer effectively spread the surface heat from the channel resulting in reduction of the lattice temperature and enhances the mechanical properties. The drain current in the AlN-passivated device significantly increases about 30% higher than that in un passivated AlN layer device which is consistent with previous experimental data and demonstrates that the current collapse can be suppressed by dielectric AlN passivation process.
Keywords
aluminium alloys; gallium alloys; high electron mobility transistors; passivation; A1N passivation effect; AlGaN; GaN; HEMT; TCAD simulation; mechanical properties; self-consistent electro-thermo-mechanical analysis; Aluminum gallium nitride; Gallium nitride; HEMTs; Lattices; MODFETs; Passivation; Stress; AlGaN/GaN; AlN passivation; HEMT; electro-thermo-mechanical; reliability;
fLanguage
English
Publisher
ieee
Conference_Titel
TENCON 2011 - 2011 IEEE Region 10 Conference
Conference_Location
Bali
ISSN
2159-3442
Print_ISBN
978-1-4577-0256-3
Type
conf
DOI
10.1109/TENCON.2011.6129029
Filename
6129029
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