Parameter estimation in a dynamic model for rapid thermal processing: theory and experimental results

Author

Belikov, Sergey ; Kaplinsky, Michael ; Friedland, Bernard

Author_Institution

New Jersey Inst. of Technol., Newark, NJ, USA

Volume

1

fYear

1995

fDate

21-23 Jun 1995

Firstpage

7

Abstract

The state variables of the dynamics of heat transfer in a rapid thermal processing system can be efficiently represented by the coefficients of a Bessel function expansion of the temperature distribution in a circular wafer. An algorithm developed in 1993 by Friedland is investigated for estimating parameters in the differential equations for the Bessel coefficients. Simulation results, which show excellent performance, are supported by favorable experimental results obtained in an actual RTP chamber

Keywords

Bessel functions; closed loop systems; feedback; heat transfer; observers; parameter estimation; process control; rapid thermal processing; semiconductor process modelling; temperature distribution; Bessel coefficients; Bessel function expansion; circular wafer; differential equations; dynamic model; heat transfer; parameter estimation; rapid thermal processing; temperature distribution; Control systems; Force control; Heat transfer; Lamps; Parameter estimation; Rapid thermal processing; Semiconductor device modeling; Temperature control; Temperature measurement; Temperature sensors;

fLanguage

English

Publisher

ieee

Conference_Titel

American Control Conference, Proceedings of the 1995

Conference_Location

Seattle, WA

Print_ISBN

0-7803-2445-5

Type

conf

DOI

10.1109/ACC.1995.529196

Filename

529196