DocumentCode :
3005872
Title :
Aluminum plug formation by excimer laser irradiation for planarized multilevel metallization
Author :
Mukai, R. ; Kobayashi, K. ; Nakano, M.
Author_Institution :
Fujitsu Ltd., Kawasaki, Japan
fYear :
1989
fDate :
12-13 Jun 1989
Firstpage :
495
Abstract :
Summary form only given. An aluminum-plug-formation technique achieved by excimer laser irradiation for planarized multilevel metallization is presented. The plug was formed by pyrolytic reactions using pulses from an XeCl excimer laser (150 mJ). The optical pulses are focused on an optical system to increase optical fluence. The optical system redefines and homogenizes the laser beam to a size of 2×2 mm2 and is mounted on an X-Y stage which tracks the beam across the sample. A plug formed by four pulses is shown. During the irradiation, the sample was kept at room temperature, and the total of the amount of aluminum was controlled to just fill in each via hole. On the resulting surface insulator, aluminum is not found
Keywords :
aluminium; laser beam applications; metallisation; pyrolysis; Al plug formation; X-Y stage; XeCl; excimer laser irradiation; optical fluence; optical pulses; planarized multilevel metallization; pyrolytic reactions; via hole; Aluminum; Filling; Laser beams; Metallization; Optical films; Optical pulses; Optical refraction; Particle beam optics; Planarization; Plugs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Multilevel Interconnection Conference, 1989. Proceedings., Sixth International IEEE
Conference_Location :
Santa Clara, CA
Type :
conf
DOI :
10.1109/VMIC.1989.78049
Filename :
78049
Link To Document :
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