• DocumentCode
    3006834
  • Title

    Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography

  • Author

    Wachulak, P.W. ; Capeluto, M.G. ; Marconi, M.C. ; Menoni, C.S. ; Rocca, J.J.

  • Author_Institution
    Colorado State Univ., Fort Collins
  • fYear
    2007
  • fDate
    6-11 May 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top lambda=46.9 nm wavelength laser. Patterns of different geometries with features ~60 nm FWHM were printed controlling the exposure dose.
  • Keywords
    laser materials processing; light interferometry; nanolithography; nanostructured materials; photolithography; FWHM; multiple exposure interferometric lithography; nanodot arrays; size 100 nm; table top extreme ultraviolet interferometric laser lithography; wavelength 46.9 nm; Interference; Interferometric lithography; Laser beams; Laser theory; Mirrors; Optical arrays; Optical interferometry; Resists; Ultraviolet sources; X-ray lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-55752-834-6
  • Type

    conf

  • DOI
    10.1109/CLEO.2007.4452704
  • Filename
    4452704
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3006834