Title :
Arrays of sub-100 nm features fabricated with table top extreme ultraviolet interferometric laser lithography
Author :
Wachulak, P.W. ; Capeluto, M.G. ; Marconi, M.C. ; Menoni, C.S. ; Rocca, J.J.
Author_Institution :
Colorado State Univ., Fort Collins
Abstract :
Arrays of nano-dots were demonstrated by multiple exposure interferometric lithography using a table top lambda=46.9 nm wavelength laser. Patterns of different geometries with features ~60 nm FWHM were printed controlling the exposure dose.
Keywords :
laser materials processing; light interferometry; nanolithography; nanostructured materials; photolithography; FWHM; multiple exposure interferometric lithography; nanodot arrays; size 100 nm; table top extreme ultraviolet interferometric laser lithography; wavelength 46.9 nm; Interference; Interferometric lithography; Laser beams; Laser theory; Mirrors; Optical arrays; Optical interferometry; Resists; Ultraviolet sources; X-ray lasers;
Conference_Titel :
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/CLEO.2007.4452704
