DocumentCode
3007060
Title
Modeling, fabrication and high power optical characterization of plasmonic waveguides
Author
Lavrinenko, A. ; Lysenko, O.
Author_Institution
Dept. of Photonics Eng., Tech. Univ. of Denmark, Lyngby, Denmark
fYear
2015
fDate
21-24 April 2015
Firstpage
245
Lastpage
248
Abstract
This paper describes modeling, fabrication and high power optical characterization of thin gold films embedded in silicon dioxide. The propagation vector of surface plasmon polaritons has been calculated by the effective index method for the wavelength range of 750-1700 nm and film thickness of 15, 30 and 45 nm. The fabrication process of such plasmonic waveguides with width in the range of 1-100 μm and their quality inspection are described. The results of optical characterization of plasmonic waveguides using a high power laser with the peak power wavelength 1064 nm show significant deviation from the linear propagation regime of surface plasmon polaritons at the average input power of 100 mW and above. Possible reasons for this deviation are heating of the waveguides and subsequent changes in the coupling and propagation losses.
Keywords
gold; metallic thin films; nanophotonics; nanostructured materials; optical fabrication; optical losses; optical waveguides; plasmonics; polaritons; silicon compounds; surface plasmons; Au-SiO2; coupling losses; effective index method; film thickness; high-power laser; linear propagation; optical characterization; plasmonic waveguides; propagation losses; propagation vector; quality inspection; silicon dioxide; surface plasmon polaritons; thin gold films; wavelength 750 nm to 1700 nm; Optical device fabrication; Optical fibers; Optical surface waves; Plasmons; Surface waves; nanophotonics; optical waveguides; plasmons;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics and Nanotechnology (ELNANO), 2015 IEEE 35th International Conference on
Conference_Location
Kiev
Type
conf
DOI
10.1109/ELNANO.2015.7146884
Filename
7146884
Link To Document