Simulation of mini-band formation in triple si quantum wells based resonant tunneling diode

In this work, we investigate the formation of mini-band energy in triple Si quantum wells-based resonance tunnelling diode focusing on the effect of applied bias on the band. The formation of mini-bands is obtained from the calculation of electron tunnelling probability through the wells. The calculation is done based on transfer matrix method. The simulation results show the mini-band formation due to the appearance of discrete energy group. The changes of applied bias, quantum well width and barrier thickness causes the change of the mini-band width. These results indicate that the device structure and applied bias condition play a key role on the formation of mini-band energy in the quantum wells.