Title :
Influence of Eu-doping on wettability of TiO2 thin films
Author :
Domaradzki, J. ; Kaczmarek, D. ; Prociow, E.L. ; Wojcieszak, D. ; Gatner, D.
Author_Institution :
Fac. of Microsyst. Electron. & Photonics, Wroclaw Univ. of Technol., Wroclaw, Poland
Abstract :
In this work nanocrystalline titanium dioxide thin films doped with Eu have been presented. Structural investigation results have shown that amount of Eu in TiO2 matrix has meaningful influence on properties of the thin films, particularly on TiO2 phase and grain sizes. Our measurements have shown that Eu increases photocatalytic activity of TiO2. Eu also has high influence on adsorption of OH- groups and H2O particles on the thin films surface. The results of wettability measurements have shown that 0.1 at.% of Eu-dopant in TiO2 matrix allows to obtain hydrophilic anatase structure, which is stable up to 800degC. The wettability of nanocrystalline TiO2:Eu (0.1 at.%) thin film also increase with the increase of temperature during additional annealing. The value of wetting angle of TiO2:Eu (0.1% at.) thin film decrease at about 40% by additional annealing up to 800degC (from 85 down to 68 degrees). The increase of the wettability of the TiO2:Eu (0.1 at.%) thin film by additional annealing was also connected with decrease of quantity of OH- groups and H2O particles, which were adsorbed on the thin film surface.
Keywords :
adsorption; annealing; catalysts; europium; grain size; hydrophilicity; nanostructured materials; photochemistry; semiconductor doping; semiconductor materials; semiconductor thin films; titanium compounds; wetting; H2O particles; TiO2:Eu; adsorption; annealing; doping; grain size; hydrophilic anatase structure; nanocrystalline material; nanocrystalline titanium dioxide thin film; photocatalytic activity; thin film surface; wettability; Annealing; Coatings; Crystallization; Doping; Optical films; Optical materials; Photonics; Sputtering; Titanium; Transistors;
Conference_Titel :
Electronics Technology, 2009. ISSE 2009. 32nd International Spring Seminar on
Conference_Location :
Brno
Print_ISBN :
978-1-4244-4260-7
DOI :
10.1109/ISSE.2009.5206961