Title :
Silicon photonic wires using contact lithography
Author :
Horn, O. ; Mueller, J. ; Lipka, T. ; Amthor, J.
Author_Institution :
Dept. of Microsyst. Technol., Hamburg Univ. of Technol., Hamburg
Abstract :
In this paper a simple contact lithography with i-line or DUV is used for the production of photonic wires, which are additionally smoothed and shrunk by thermal oxidation.
Keywords :
elemental semiconductors; integrated optics; oxidation; silicon; ultraviolet lithography; DUV; Si; contact lithography; photonic wires; thermal oxidation; Etching; Lithography; Optical losses; Optical refraction; Oxidation; Photonics; Resists; Silicon; Stimulated emission; Wires;
Conference_Titel :
Group IV Photonics, 2008 5th IEEE International Conference on
Conference_Location :
Cardiff
Print_ISBN :
978-1-4244-1769-8
Electronic_ISBN :
978-1-4244-1768-1
DOI :
10.1109/GROUP4.2008.4638165
