Taguchi optimization for the processing of Epon SU-8 resist

Author

Eyre, B. ; Blosiu, J. ; Wiberg, D.

Author_Institution

Center for Space Microelectron. Technol., California Inst. of Technol., Pasadena, CA, USA

fYear

1998

fDate

25-29 Jan 1998

Firstpage

218

Lastpage

222

Abstract

Using the Taguchi technique an optimization experiment was performed to characterize the processing of Epon SU-8 negative photoresist. This photoresist has proven to be very sensitive to process variations and difficult to use. The Taguchi method reveals output sensitivity to variations in control factors. Using five processing parameters as control factors, experiments were performed and results were evaluated by comparison to ideal output characteristics. Analyzing the results, a proposed fabrication process was derived from optimizing the control factors for the best overall mean across all the outputs. The experiment was repeated for three film thicknesses: 50 μm, 100 μm,and 220 μm. The desired output characteristics were straight sidewall profile, fine line and space resolution, and adhesion to substrate. Tables show optimized processing parameters for these three film thicknesses

Keywords

micromechanical devices; optimisation; photoresists; 100 mum; 220 mum; 50 mum; Epon SU-8 resist; Taguchi optimization; adhesion; control factors; fabrication process; film thickness; fine line; optimized processing parameters; output sensitivity; photoresist; processing parameters; sidewall profile; space resolution; Absorption; Coatings; EPON; Fabrication; Optical films; Passive optical networks; Resists; Space technology; Substrates; Thick films;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 1998. MEMS 98. Proceedings., The Eleventh Annual International Workshop on

Conference_Location

Heidelberg

ISSN

1084-6999

Print_ISBN

0-7803-4412-X

Type

conf

DOI

10.1109/MEMSYS.1998.659757

Filename

659757