Title :
Taguchi optimization for the processing of Epon SU-8 resist
Author :
Eyre, B. ; Blosiu, J. ; Wiberg, D.
Author_Institution :
Center for Space Microelectron. Technol., California Inst. of Technol., Pasadena, CA, USA
Abstract :
Using the Taguchi technique an optimization experiment was performed to characterize the processing of Epon SU-8 negative photoresist. This photoresist has proven to be very sensitive to process variations and difficult to use. The Taguchi method reveals output sensitivity to variations in control factors. Using five processing parameters as control factors, experiments were performed and results were evaluated by comparison to ideal output characteristics. Analyzing the results, a proposed fabrication process was derived from optimizing the control factors for the best overall mean across all the outputs. The experiment was repeated for three film thicknesses: 50 μm, 100 μm,and 220 μm. The desired output characteristics were straight sidewall profile, fine line and space resolution, and adhesion to substrate. Tables show optimized processing parameters for these three film thicknesses
Keywords :
micromechanical devices; optimisation; photoresists; 100 mum; 220 mum; 50 mum; Epon SU-8 resist; Taguchi optimization; adhesion; control factors; fabrication process; film thickness; fine line; optimized processing parameters; output sensitivity; photoresist; processing parameters; sidewall profile; space resolution; Absorption; Coatings; EPON; Fabrication; Optical films; Passive optical networks; Resists; Space technology; Substrates; Thick films;
Conference_Titel :
Micro Electro Mechanical Systems, 1998. MEMS 98. Proceedings., The Eleventh Annual International Workshop on
Conference_Location :
Heidelberg
Print_ISBN :
0-7803-4412-X
DOI :
10.1109/MEMSYS.1998.659757
