Novel processing of high aspect ratio 1-3 structures of high density PZT

Author

Wang, S.N. ; Li, J.-F. ; Toda, R. ; Watanabe, R. ; Minami, K. ; Esashi, M.

Author_Institution

Tohoku Univ., Sendai, Japan

fYear

1998

fDate

25-29 Jan 1998

Firstpage

223

Lastpage

228

Abstract

A new process for the fabrication of fine scale, high aspect ratio PZT 1-3 composite structures has been developed. In this process, lost mold technique is utilized with a Si mold prepared by deep reactive ion etching (RIE). Due to the high strength and high melting point of Si, PZT sintering under high pressures without removing the mold becomes possible, leading to structures of highly condensed PZT in the precise shape of the mold. The typical PZT structures in this work are periodically arrayed rods 16 μm in diameter, 100 μm in height, resulting in an aspect ratio higher than six. The fabricated structures are to be applied to high resolution micro-ultrasonic transducers in the frequency range of 20 MHz for medical purpose

Keywords

biomedical equipment; biomedical ultrasonics; elemental semiconductors; microsensors; piezoelectric transducers; silicon; sputter etching; ultrasonic transducers; 100 mum; 16 mum; 20 MHz; PZT; PZT 1-3 composite structures; PbZrO3TiO3; RIE; Si mold; deep reactive ion etching; fabricated structures; fabrication; fine scale; high density PZT; hot isostatic pressing; medical purpose; microultrasonic transducers; slurry casting; Biomedical transducers; Etching; Fabrication; Plastics; Polymers; Shape; Slurries; Temperature; Ultrasonic transducer arrays; Ultrasonic transducers;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 1998. MEMS 98. Proceedings., The Eleventh Annual International Workshop on

Conference_Location

Heidelberg

ISSN

1084-6999

Print_ISBN

0-7803-4412-X

Type

conf

DOI

10.1109/MEMSYS.1998.659758

Filename

659758