• DocumentCode
    3015427
  • Title

    Compact modelling for Co/BTO/LSMO Ferroelectric Tunnel Junction

  • Author

    Zhaohao Wang ; Weisheng Zhao ; Bouchenak-Khelladi, Anes ; Yue Zhang ; Weiwei Lin ; Klein, Jacques-Olivier ; Ravelosona, Dafine ; Chappert, Claude

  • Author_Institution
    IEF, Univ. Paris-Sud 11, Orsay, France
  • fYear
    2013
  • fDate
    5-8 Aug. 2013
  • Firstpage
    229
  • Lastpage
    232
  • Abstract
    Ferroelectric Tunnel Junction (FTJ) is able to store non-volatile data in the spontaneous polarization direction of ferroelectric tunnel barrier. Recent progress have demonstrated its great potential to build up the next generation Non-volatile Memory and Logic (NVM and NVL) thanks to the high OFF/ON resistance ratio, fast operation speed, low write power, non-destructive readout and so on. In this paper, we present the first compact model for Co/BTO/LSMO FTJ nanopillar, which was reported experimentally to exhibit excellent NVM performance. This model integrates related physical models of tunnel resistance, static coercive voltage and dynamic switching delay. Its accuracy is shown by the good agreement between numerical model simulation and experimental measurements. This compact model has been developed in Verilog-A language and implemented on Cadence Virtuoso Platform. Simulations validated the static and dynamic behaviors of this model, indicating that it can be efficiently used for the analysis and design of hybrid FTJ/CMOS circuits.
  • Keywords
    barium compounds; cobalt; dielectric polarisation; electrical resistivity; ferroelectric materials; ferroelectric switching; lanthanum compounds; numerical analysis; strontium compounds; tunnelling; Cadence Virtuoso Platform; Co-BaTiO3-La0.67Sr0.33MnO3; Verilog-A language; dynamic switching delay; ferroelectric tunnel barrier; ferroelectric tunnel junction; hybrid FTJ-CMOS circuits; nondestructive readout; nonvolatile logic; nonvolatile memory; numerical model simulation; off-on resistance ratio; spontaneous polarization; static coercive voltage; tunnel resistance; Integrated circuit modeling; Junctions; Nonvolatile memory; Numerical models; Resistance; Semiconductor device modeling; Switches; Compact model; Ferroelectric Tunnel Junction; Non-volatile; Static and dynamic behavior;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
  • Conference_Location
    Beijing
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4799-0675-8
  • Type

    conf

  • DOI
    10.1109/NANO.2013.6720853
  • Filename
    6720853