DocumentCode
3015427
Title
Compact modelling for Co/BTO/LSMO Ferroelectric Tunnel Junction
Author
Zhaohao Wang ; Weisheng Zhao ; Bouchenak-Khelladi, Anes ; Yue Zhang ; Weiwei Lin ; Klein, Jacques-Olivier ; Ravelosona, Dafine ; Chappert, Claude
Author_Institution
IEF, Univ. Paris-Sud 11, Orsay, France
fYear
2013
fDate
5-8 Aug. 2013
Firstpage
229
Lastpage
232
Abstract
Ferroelectric Tunnel Junction (FTJ) is able to store non-volatile data in the spontaneous polarization direction of ferroelectric tunnel barrier. Recent progress have demonstrated its great potential to build up the next generation Non-volatile Memory and Logic (NVM and NVL) thanks to the high OFF/ON resistance ratio, fast operation speed, low write power, non-destructive readout and so on. In this paper, we present the first compact model for Co/BTO/LSMO FTJ nanopillar, which was reported experimentally to exhibit excellent NVM performance. This model integrates related physical models of tunnel resistance, static coercive voltage and dynamic switching delay. Its accuracy is shown by the good agreement between numerical model simulation and experimental measurements. This compact model has been developed in Verilog-A language and implemented on Cadence Virtuoso Platform. Simulations validated the static and dynamic behaviors of this model, indicating that it can be efficiently used for the analysis and design of hybrid FTJ/CMOS circuits.
Keywords
barium compounds; cobalt; dielectric polarisation; electrical resistivity; ferroelectric materials; ferroelectric switching; lanthanum compounds; numerical analysis; strontium compounds; tunnelling; Cadence Virtuoso Platform; Co-BaTiO3-La0.67Sr0.33MnO3; Verilog-A language; dynamic switching delay; ferroelectric tunnel barrier; ferroelectric tunnel junction; hybrid FTJ-CMOS circuits; nondestructive readout; nonvolatile logic; nonvolatile memory; numerical model simulation; off-on resistance ratio; spontaneous polarization; static coercive voltage; tunnel resistance; Integrated circuit modeling; Junctions; Nonvolatile memory; Numerical models; Resistance; Semiconductor device modeling; Switches; Compact model; Ferroelectric Tunnel Junction; Non-volatile; Static and dynamic behavior;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
Conference_Location
Beijing
ISSN
1944-9399
Print_ISBN
978-1-4799-0675-8
Type
conf
DOI
10.1109/NANO.2013.6720853
Filename
6720853
Link To Document