Title :
Crosstalk reduction of silicon nanowire AWG with shallow-etched grating arms
Author :
Kim, Duk-Jun ; Lee, Jong-Moo ; Song, Jung Ho ; Pyo, Junghyung ; Kim, Gyungock
Author_Institution :
Convergence & Components & Mater. Res. Lab., Electron. & Telecommun. Res. Inst. (ETRI), Daejeon
Abstract :
The grating arms composed of silicon nanowires were shallow-etched to reduce the random phase error caused by the core width fluctuation. A fairly improved crosstalk value of 18 dB was achieved in the arrayed-waveguide grating with the on-chip loss of 3 dB.
Keywords :
arrayed waveguide gratings; etching; integrated optics; nanowires; optical crosstalk; optical fabrication; optical losses; silicon-on-insulator; Si-SiO2; arrayed-waveguide grating; core width fluctuation; crosstalk reduction; loss 3 dB; on-chip loss; random phase error; shallow-etched grating arms; silicon nanowire AWG; silicon-on-insulator wafer; Arm; Arrayed waveguide gratings; Crosstalk; Etching; Fluctuations; Optical interferometry; Optical waveguides; Phased arrays; Polarization; Silicon;
Conference_Titel :
Group IV Photonics, 2008 5th IEEE International Conference on
Conference_Location :
Cardiff, Wales
Print_ISBN :
978-1-4244-1769-8
Electronic_ISBN :
978-1-4244-1768-1
DOI :
10.1109/GROUP4.2008.4638187
