• DocumentCode
    3015494
  • Title

    Raman spectroscopy study of low energy He+ ion irradiation effect in graphene transferred onto SiO2

  • Author

    Chenxing Deng ; Weiwei Lin ; Eimer, S. ; Ravelosona, Dafine ; Chappert, Claude ; Weisheng Zhao

  • Author_Institution
    Inst. d´Electron. Fondamentale, Univ. Paris-Sud, Orsay, France
  • fYear
    2013
  • fDate
    5-8 Aug. 2013
  • Firstpage
    903
  • Lastpage
    906
  • Abstract
    We studied the low energy (5.4 keV) He+ ion irradiation effect on the properties of chemical vapor deposited graphene transferred onto SiO2/Si substrate. For a small dose density of 4 × 1012 He+/cm2, both the G and 2D bands in the Raman spectra exhibit blue-shift and the intensity ratio of the 2D and G peaks decreases. The intensity ratio of the D and G peaks increases a lot as the dose density is larger than 1.2 × 1013 He+/cm2. It suggests that before the formation of large amount of defects, low energy He+ ion irradiation may induce charge-transfer doping in graphene due to the presence of polymer residues. Broad spatial distributions of the band shift and the intensity ratio indicate inhomogeneity of doping level in graphene.
  • Keywords
    Raman spectra; charge transfer states; chemical vapour deposition; doping profiles; graphene; ion beam effects; spectral line shift; C; Raman spectroscopy; SiO2-Si; blue shift; broad spatial distribution; charge transfer doping; chemical vapor deposition; density dose; doping level; electron volt energy 5.4 keV; intensity ratio; low energy helium ion irradiation effect; polymer residues; silica-silicon substrate; Charge carrier processes; Chemicals; Doping; Graphene; Radiation effects; Raman scattering; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
  • Conference_Location
    Beijing
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4799-0675-8
  • Type

    conf

  • DOI
    10.1109/NANO.2013.6720857
  • Filename
    6720857