DocumentCode
3015494
Title
Raman spectroscopy study of low energy He+ ion irradiation effect in graphene transferred onto SiO2
Author
Chenxing Deng ; Weiwei Lin ; Eimer, S. ; Ravelosona, Dafine ; Chappert, Claude ; Weisheng Zhao
Author_Institution
Inst. d´Electron. Fondamentale, Univ. Paris-Sud, Orsay, France
fYear
2013
fDate
5-8 Aug. 2013
Firstpage
903
Lastpage
906
Abstract
We studied the low energy (5.4 keV) He+ ion irradiation effect on the properties of chemical vapor deposited graphene transferred onto SiO2/Si substrate. For a small dose density of 4 × 1012 He+/cm2, both the G and 2D bands in the Raman spectra exhibit blue-shift and the intensity ratio of the 2D and G peaks decreases. The intensity ratio of the D and G peaks increases a lot as the dose density is larger than 1.2 × 1013 He+/cm2. It suggests that before the formation of large amount of defects, low energy He+ ion irradiation may induce charge-transfer doping in graphene due to the presence of polymer residues. Broad spatial distributions of the band shift and the intensity ratio indicate inhomogeneity of doping level in graphene.
Keywords
Raman spectra; charge transfer states; chemical vapour deposition; doping profiles; graphene; ion beam effects; spectral line shift; C; Raman spectroscopy; SiO2-Si; blue shift; broad spatial distribution; charge transfer doping; chemical vapor deposition; density dose; doping level; electron volt energy 5.4 keV; intensity ratio; low energy helium ion irradiation effect; polymer residues; silica-silicon substrate; Charge carrier processes; Chemicals; Doping; Graphene; Radiation effects; Raman scattering; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
Conference_Location
Beijing
ISSN
1944-9399
Print_ISBN
978-1-4799-0675-8
Type
conf
DOI
10.1109/NANO.2013.6720857
Filename
6720857
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