• DocumentCode
    3015585
  • Title

    High current plasma electron emitter

  • Author

    Fiksel, G. ; Craig, D. ; Hartog, D.J.D. ; Holly, D. ; Kendrick, R. ; Lovell, T.W. ; Oliva, S. ; Prager, S.C. ; Sarff, J.S. ; Thomas, M.A.

  • Author_Institution
    Sterling Sci. Inc., Madison, WI, USA
  • fYear
    1996
  • fDate
    3-5 June 1996
  • Firstpage
    219
  • Abstract
    Summary form only given, as follows. A high current plasma electron emitter based on a miniature plasma source has been developed. The source is characterized by a high electron emission current density and emission current, small size, and low impurity content. The emitting plasma is created by a pulsed high current gas discharge. The source is biased negatively to extract electrons. Electron currents of the order of 1 kA at a bias voltage of about 100 V are obtained. The source has a simple design and has proven to be very reliable in operation. Extensive studies of the effect of the source geometry and materials have been conducted. The gas feed through, power dissipation, and impurity content were measured. A high emission current, small size (3-4 cm in diameter), and low impurity generation make the source attractive for a variety of fusion and technological applications. Injectors with 1 kA electron emission current and a pulse duration of 10 ms will be used for a 20 kA electrostatic current injection experiment in the Madison Symmetric Torus (MST) reversed-field pinch.
  • Keywords
    plasma devices; 1 kA; 100 V; 20 kA; MST; Madison Symmetric Torus reversed-field pinch; electron currents; electron emission current density; electrostatic current injection; fusion applications; high current plasma electron emitter; impurity generation; miniature plasma source; power dissipation; pulsed high current gas discharge; source geometry; technological applications; Conducting materials; Current density; Discharges; Electron emission; Electron guns; Geometry; Impurities; Plasma density; Plasma sources; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
  • Conference_Location
    Boston, MA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3322-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1996.550936
  • Filename
    550936