DocumentCode
3015827
Title
Dielectric breakdown and electroforming phenomenon in the cadmium arsenide thin films devices
Author
Din, Mahadzir Bin Haji ; Gould, R.D.
Author_Institution
Mara Inst. of Technol., Arau, Malaysia
fYear
1998
fDate
1998
Firstpage
179
Lastpage
183
Abstract
In this high conductivity semiconductor material, it is not possible to distinguish between the onset of these two processes, and it is highly probable that the two processes are initiated simultaneously. Electroforming is normally observed in insulating materials (Ray and Hogarth 1984), where there is a very rapid increase in the current drawn at a particular moment. In the test device, a decrease in current was observed at the field Fb, which may be identified with dielectric breakdown; however, after this event the samples showed the typical electroforming characteristic of voltage-controlled differential negative resistance (VCNR) for both increasing and decreasing voltages. The basic characteristics observed for both these phenomena are discussed in the paper
Keywords
cadmium compounds; electroforming; narrow band gap semiconductors; negative resistance; semiconductor device breakdown; semiconductor device testing; semiconductor thin films; Cd3As2; cadmium arsenide thin film devices; current; dielectric breakdown; electric field; electroforming; electroforming characteristic; electroforming phenomenon; high conductivity semiconductor material; insulating materials; process onset; test device; voltage-controlled differential negative resistance; Breakdown voltage; Cadmium compounds; Conducting materials; Dielectric breakdown; Dielectric materials; Dielectric thin films; Electric breakdown; Electrons; Semiconductor materials; Thin film devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Electronics, 1998. Proceedings. ICSE '98. 1998 IEEE International Conference on
Conference_Location
Bangi
Print_ISBN
0-7803-4971-7
Type
conf
DOI
10.1109/SMELEC.1998.781175
Filename
781175
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