DocumentCode
3015831
Title
Novel fabrication tolerant flat-top demultiplexers based on etched diffraction gratings in SOI
Author
Feng, Dazeng ; Qian, Wei ; Liang, Hong ; Kung, Cheng-Chih ; Fong, Joan ; Luff, B. Jonathan ; Asghari, Mehdi
Author_Institution
Kotura Inc, Monterey, CA
fYear
2008
fDate
17-19 Sept. 2008
Firstpage
386
Lastpage
388
Abstract
Flat-top demultiplexers using etched diffraction gratings in the silicon-on-insulator (SOI) platform are reported and experimentally demonstrated. The novel design enables the loss and crosstalk of the devices to be insensitive to the vertical angle of the grating facets.
Keywords
demultiplexing equipment; diffraction gratings; integrated optics; optical communication equipment; optical crosstalk; optical design techniques; optical fabrication; optical losses; silicon-on-insulator; CWDM DeMux; EDG DeMux; SOI platform; Si; etched diffraction grating; grating facets; optical crosstalk; optical loss; tolerant flat-top demultiplexer; Arrayed waveguide gratings; Crosstalk; Diffraction gratings; Equations; Etching; Fabrication; Optical waveguides; Silicon; Slabs; Wavelength division multiplexing;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2008 5th IEEE International Conference on
Conference_Location
Cardiff
Print_ISBN
978-1-4244-1769-8
Electronic_ISBN
978-1-4244-1768-1
Type
conf
DOI
10.1109/GROUP4.2008.4638208
Filename
4638208
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