Title :
Novel fabrication tolerant flat-top demultiplexers based on etched diffraction gratings in SOI
Author :
Feng, Dazeng ; Qian, Wei ; Liang, Hong ; Kung, Cheng-Chih ; Fong, Joan ; Luff, B. Jonathan ; Asghari, Mehdi
Author_Institution :
Kotura Inc, Monterey, CA
Abstract :
Flat-top demultiplexers using etched diffraction gratings in the silicon-on-insulator (SOI) platform are reported and experimentally demonstrated. The novel design enables the loss and crosstalk of the devices to be insensitive to the vertical angle of the grating facets.
Keywords :
demultiplexing equipment; diffraction gratings; integrated optics; optical communication equipment; optical crosstalk; optical design techniques; optical fabrication; optical losses; silicon-on-insulator; CWDM DeMux; EDG DeMux; SOI platform; Si; etched diffraction grating; grating facets; optical crosstalk; optical loss; tolerant flat-top demultiplexer; Arrayed waveguide gratings; Crosstalk; Diffraction gratings; Equations; Etching; Fabrication; Optical waveguides; Silicon; Slabs; Wavelength division multiplexing;
Conference_Titel :
Group IV Photonics, 2008 5th IEEE International Conference on
Conference_Location :
Cardiff
Print_ISBN :
978-1-4244-1769-8
Electronic_ISBN :
978-1-4244-1768-1
DOI :
10.1109/GROUP4.2008.4638208
