• DocumentCode
    3015968
  • Title

    High-field magnetoresistance effects and temperature-dependent spin relaxation in rubrene nanowire spin valves

  • Author

    Alam, Kazi Masudul ; Bodepudi, Srikrishna Chanakya ; Starko-Bowes, Ryan ; Pramanik, Sarah

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Alberta, Edmonton, AB, Canada
  • fYear
    2013
  • fDate
    5-8 Aug. 2013
  • Firstpage
    841
  • Lastpage
    844
  • Abstract
    In this work we discuss the high-field magnetoresistance effects and temperature-dependent spin relaxation in rubrene nanowire spin valves. Rubrene thin film spin valves have been studied by several groups in the past since this material can potentially offer long spin relaxation length (Ls). However, the Ls values reported so far have been low, typically ~10 nm at low temperatures (~10K). Recently we have reported a vertical spin valve device using rubrene spacer, in which rubrene is patterned in a nanowire array geometry. Such patterning leads to significant suppression of spin relaxation and we have reported spin relaxation length of ~47 nm at ~10K in rubrene nanowires. In this work we present the high field magnetoresistance measurements performed on rubrene nanowires and discuss the possible origins of these effects. Further, we discuss possible origin of the observed temperature-dependence of spin relaxation length.
  • Keywords
    magnetic thin films; magnetoresistance; nanofabrication; nanomagnetics; nanopatterning; nanowires; organic semiconductors; semiconductor thin films; spin valves; high-field magnetoresistance effects; nanowire array geometry; rubrene nanowire spin valves; rubrene spacer; rubrene thin film spin valves; temperature-dependent spin relaxation; vertical spin valve device; Correlation; Magnetic semiconductors; Magnetoresistance; Magnetoresistive devices; Organic materials; Saturation magnetization; Valves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
  • Conference_Location
    Beijing
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4799-0675-8
  • Type

    conf

  • DOI
    10.1109/NANO.2013.6720880
  • Filename
    6720880