DocumentCode :
3016241
Title :
Development of ferromagnetic shape memory alloy - silicon bimorph nanoactuators
Author :
Lay, Christian ; Aseguinolaza, Ivan ; Chernenko, Volodymyr ; Kohl, Michael
Author_Institution :
Inst. of Microstructure Technol., Karlsruhe Inst. of Technol., Karlsruhe, Germany
fYear :
2013
fDate :
5-8 Aug. 2013
Firstpage :
954
Lastpage :
957
Abstract :
This paper presents the development and fabrication of first-of-its kind free-standing ferromagnetic shape memory alloy (FSMA)/Si bimorph cantilevers. The exploitation of FSMAs such as Ni-Mn-Ga is of large interest for nanoactuation due to their multifunctional ferromagnetic and shape memory properties allowing for large work density. A new nanofabrication process is developed consisting of electron-beam lithography, Si reactive ion etching and the deposition of Ni-Mn-Ga films on pre-structured Si substrates. For decreasing dimensions of Si nanocantilevers, a pronounced size effect of self-organized FSMA deposition is observed once the cantilever width matches the grain size of 100 nm, which is comparable to the size of magnetic domains.
Keywords :
actuators; alloys; cantilevers; electron beam lithography; elemental semiconductors; ferromagnetic materials; gallium; manganese; nanofabrication; nickel; silicon; sputter etching; Ni-Mn-Ga; Si; electron-beam lithography; ferromagnetic shape memory alloy; film deposition; magnetic domains; nanofabrication process; reactive ion etching; silicon bimorph cantilevers; silicon bimorph nanoactuators; size 100 nm; Films; Magnetic domains; Nanostructures; Resists; Shape; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
Conference_Location :
Beijing
ISSN :
1944-9399
Print_ISBN :
978-1-4799-0675-8
Type :
conf
DOI :
10.1109/NANO.2013.6720892
Filename :
6720892
Link To Document :
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