Title :
Three-Dimensional Photonic Crystals Fabricated by Double-Angled Plasma Etching
Author :
Takahashi, Shigeki ; Nakamori, Takeshi ; Okano, Makoto ; Imada, Masahiro ; Noda, Susumu
Author_Institution :
Kyoto Univ., Kyoto
Abstract :
Three-dimensional photonic crystals with a depth of two lattice constants are successfully fabricated by a two-stage angled plasma etching method. The sample showed ~90% reflectance and ~10 dB attenuation around the photonic bandgap wavelength region.
Keywords :
etching; lattice constants; light absorption; light reflection; optical fabrication; optical materials; photonic band gap; photonic crystals; plasma materials processing; attenuation parameters; double-angled plasma etching method; lattice constants; photonic bandgap wavelength region; reflectance parameters; three-dimensional photonic crystals fabrication; Etching; Lattices; Optical attenuators; Optical device fabrication; Personal communication networks; Photonic crystals; Plasma applications; Reflectivity; Stacking; Stimulated emission;
Conference_Titel :
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/CLEO.2007.4453246
