• DocumentCode
    3016590
  • Title

    Jet rollable nanoimprint lithography with piezoelectric jetting of resist

  • Author

    Gehlhausen, David ; Menezes, Shalini ; Lichuan Chen ; Gyu-ho Kim ; Hongbing Lu ; Jinming Gao ; Hu, Wenfeng

  • Author_Institution
    Mech. Eng. Dept., Univ. of Texas at Dallas, Richardson, TX, USA
  • fYear
    2013
  • fDate
    5-8 Aug. 2013
  • Firstpage
    1172
  • Lastpage
    1175
  • Abstract
    We report an jet rollable nanoimprint lithography tool as a low cost method to produce micro- and nano-structures rapidly over large areas. We integrated a piezoelectric nozzle to deposit resist in-line in a low-waste, high-precision manner. We demonstrate the capabilities of this system by creating a variety of microstructures in SU8 resist with high pattern transfer fidelity.
  • Keywords
    jets; nanolithography; piezoelectric devices; resists; soft lithography; jet rollable nanoimprint lithography; microstructure production; nanostructure production; piezoelectric jetting; piezoelectric nozzle; Belts; Films; Nanolithography; Resists; Viscosity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
  • Conference_Location
    Beijing
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4799-0675-8
  • Type

    conf

  • DOI
    10.1109/NANO.2013.6720909
  • Filename
    6720909
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3016590