Silver surface-enhanced raman scattering substrates prepared by a nanofabrication process using Electron Beam Lithography and magnetron sputtering

Author

Wenjun Zhang ; Pengfei Nan ; Bing-Rui Lu ; Yifang Chen ; Vadgama, Pankaj ; Xin-Ping Qu

Author_Institution

State Key Lab. of Mater. Process. & Die & Mould Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China

fYear

2013

fDate

5-8 Aug. 2013

Firstpage

1220

Lastpage

1223

Abstract

The tunable silver nano-pillar arrays were fabricated by using Electron Beam Lithography and direct current magnetron sputtering technique successfully. The as-prepared substrates retain an excellent Raman-enhancement characteristic. The developed process provides a reproducible and reliable method to fabricate the Surface-enhanced Raman Scattering substrate particularly for the high sensitivity biological detections.

Keywords

electron beam lithography; nanofabrication; nanolithography; silver; sputter deposition; surface enhanced Raman scattering; Ag; Raman-enhancement characteristics; direct current magnetron sputtering; electron beam lithography; high-sensitivity biological detections; nanofabrication; silver nanopillar arrays; silver surface-enhanced Raman scattering substrates; Lithography; Raman scattering; Silicon; Silver; Sputtering; Substrates; Surface treatment;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on

Conference_Location

Beijing

ISSN

1944-9399

Print_ISBN

978-1-4799-0675-8

Type

conf

DOI

10.1109/NANO.2013.6720912

Filename

6720912