DocumentCode :
3017288
Title :
IDDQ Testing Method using a Scan Pattern for Production Testing
Author :
Hirase, Junichi ; Goi, Yoshiyuki ; Tanaka, Yoshiyuki
Author_Institution :
Matsushita Electric Industrial Co., Ltd.
fYear :
2005
fDate :
18-21 Dec. 2005
Firstpage :
18
Lastpage :
21
Abstract :
With the miniaturization of the diffusion process, the leak current per transistor tends to increase and the number of transistors per die tends to become larger, thus rendering more difficult the discrimination through the absolute value of IDDQ (Quiescent power supply current) that is required to detect defects on VLSI (Very Large Scale Integration). On the other hand, scan patterns convenient for their logical quality improvement are widely used. When adopting such a scan pattern and measuring the IDDQ, one finds that the measured values do not fluctuate greatly. In this paper, we will present a method of determining good and defective dies by making an approximation of this distribution using a gamma distribution and we will demonstrate the efficiency of our method through corroborative results.
Keywords :
Current supplies; Diffusion processes; Electricity supply industry; Equations; Fault detection; Leak detection; Process control; Production; Testing; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Test Symposium, 2005. Proceedings. 14th Asian
ISSN :
1081-7735
Print_ISBN :
0-7695-2481-8
Type :
conf
DOI :
10.1109/ATS.2005.66
Filename :
1575400
Link To Document :
بازگشت