DocumentCode :
3018344
Title :
Structure analysis of nano-scale dual-step fabricated by Focused Ion Beam
Author :
Chen-ying Wang ; Zhuang-de Jiang ; Shu-ming Yang ; Wei-xuan Jing ; Qi-jing Lin ; Feng Han
Author_Institution :
State Key Lab. for Manuf. Syst. Eng., Xi´an Jiaotong Univ., Xi´an, China
fYear :
2013
fDate :
5-8 Aug. 2013
Firstpage :
829
Lastpage :
832
Abstract :
A nano-scale dual-step was made by Focused Ion Beam (FIB). The shape of the nano two-step was measured using Atom Force Microscope (AFM). The parameter values in different location of the nano dual-step are compared, including the height h, the base surface roughness Rabase, the first-step surface roughness Rastep1, the second-step surface roughness Rastep2 and the sidewall inclination θ1, θ2. It was shown that the control of z direction was difficulte when the size was ≤ 50 nm.
Keywords :
atomic force microscopy; focused ion beam technology; nanofabrication; nanostructured materials; sputter etching; surface roughness; AFM; FIB; atom force microscopy; base surface roughness; first-step surface roughness; focused ion beam etching; nanoscale dual-step; nanoscale height; nanoscale two-step shape; sidewall inclination; structure analysis; Atomic measurements; Educational institutions; Ion beams; Machining; Rough surfaces; Surface roughness; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
Conference_Location :
Beijing
ISSN :
1944-9399
Print_ISBN :
978-1-4799-0675-8
Type :
conf
DOI :
10.1109/NANO.2013.6720987
Filename :
6720987
Link To Document :
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