Nanomagnetic logic devices fabrication using nanoimprint lithography

Author

Imtaar, Muhammad Atyab ; Peng Li ; Varga, Edit ; Csaba, Gyorgy ; Bernstein, Gary H. ; Scarpa, Giuseppe ; Porod, Wolfgang ; Lugli, Paolo

Author_Institution

Inst. for Nanoelectron., Tech. Univ. of Munich, Munich, Germany

fYear

2013

fDate

5-8 Aug. 2013

Firstpage

578

Lastpage

581

Abstract

We present large scale fabrication of nanomagnetic logic devices using nanoimprint lithography. This is a fast and cost-effective way to fabricate nanomagnetic logic devices. Nanoimprint lithography is used for polymer patterning, followed by e-beam evaporation of Supermalloy and liftoff. Scanning electron microscope, atomic force microscope and magnetic force microscope, measurements have been done to verify the eligibility of this method.

Keywords

atomic force microscopy; electron beam deposition; logic devices; magnetic force microscopy; nanolithography; nanomagnetics; scanning electron microscopy; soft lithography; atomic force microscope; e-beam evaporation; large scale fabrication; liftoff; magnetic force microscope; nanoimprint lithography; nanomagnetic logic devices; polymer patterning; scanning electron microscope; supermalloy; Fabrication; Logic gates; Magnetic force microscopy; Magnetic resonance imaging; Polymers; Scanning electron microscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on

Conference_Location

Beijing

ISSN

1944-9399

Print_ISBN

978-1-4799-0675-8

Type

conf

DOI

10.1109/NANO.2013.6720988

Filename

6720988