DocumentCode :
3018533
Title :
Reliability of carbon nanotube bumps for chip on film application
Author :
Xiaolei Li ; Wei Mu ; Di Jiang ; Yifeng Fu ; Yan Zhang ; Johan Liu
Author_Institution :
Key Lab. of Adv. Display & Syst. Applic., Shanghai Univ., Shanghai, China
fYear :
2013
fDate :
5-8 Aug. 2013
Firstpage :
845
Lastpage :
848
Abstract :
Carbon nanotubes (CNTs) are an ideal candidate for electrical interconnects due to their extraordinary thermal, electrical and mechanical properties. In this work, as-densified CNT bumps were applied as chip on film (COF) interconnection material. A silicon chip with patterned CNT bumps was bonded onto a flexible substrate using anisotropic conductive adhesive (ACA) with bonding pressure, at 127.4 MPa, 170 °C and for 8 seconds. The electrical properties of this structure were evaluated by measuring the contact resistance of each bump using the four-point probe method. Thermal cycling (-40~85°C, 1000 cycles) and damp heat tests (85°C/85% RH, 1000 hours) were conducted to evaluate the reliabilities of the CNT-COF structure bonded with ACA. The average contact resistances of two samples used for the reliability tests were 226 mΩ and 260mΩ. No electrical failure was observed after the damp heat test and only two were observed after the thermal cycling test. The average contact resistance was increased only 15.7% and 13.8%, respectively, after the thermal cycling and the damp heat tests.
Keywords :
carbon nanotubes; conductive adhesives; contact resistance; integrated circuit interconnections; semiconductor device reliability; anisotropic conductive adhesive; bonding pressure; carbon nanotube bumps; chip on film application; contact resistance; damp heat tests; electrical interconnects; electrical properties; flexible substrate; four point probe method; mechanical properties; patterned CNT bumps; pressure 127.4 MPa; reliability tests; resistance 226 mohm; resistance 260 mohm; silicon chip; temperature 170 degC; temperature 85 degC; thermal cycling; thermal properties; time 1000 hr; time 8 s; Carbon nanotubes; Contact resistance; Electrical resistance measurement; Reliability; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
Conference_Location :
Beijing
ISSN :
1944-9399
Print_ISBN :
978-1-4799-0675-8
Type :
conf
DOI :
10.1109/NANO.2013.6720993
Filename :
6720993
Link To Document :
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