DocumentCode
3019638
Title
In-situ Pulse Characterization for Silicon Micromachining
Author
Zhu, Xin ; Gunaratne, Tissa C. ; Dantus, Marcos
Author_Institution
Michigan State Univ., East Lansing
fYear
2007
fDate
6-11 May 2007
Firstpage
1
Lastpage
2
Abstract
Femtosecond pulse characterization and adaptive pulse compression is demonstrated using surface second harmonic generation from a silicon wafer using multiphoton intrapulse interference phase scan (MIIPS).
Keywords
elemental semiconductors; high-speed optical techniques; optical harmonic generation; optical pulse compression; silicon; Si; adaptive pulse compression; femtosecond pulse characterization; micromachining; multiphoton intrapulse interference phase scan; silicon wafer; surface second harmonic generation; Micromachining; Nonlinear optics; Optical harmonic generation; Optical pulse generation; Optical pulse shaping; Pulse amplifiers; Pulse compression methods; Pulse shaping methods; Silicon; Ultrafast optics;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-55752-834-6
Type
conf
DOI
10.1109/CLEO.2007.4453394
Filename
4453394
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