DocumentCode :
3020224
Title :
Atomic scale simulation of a junctionless silicon nanowire transistor
Author :
Ansari, Lida ; Feldman, Baruch ; Fagas, Giorgos ; Colinge, Jean-Pierre ; Greer, James C.
Author_Institution :
Tyndall National Institute, University College Cork, Cork, Ireland
fYear :
2011
fDate :
14-16 March 2011
Firstpage :
1
Lastpage :
3
Abstract :
We have simulated silicon nanowire junctionless transistors with a 3 nm gate length within a Density Functional Theory (DFT) framework. We explored the response of transistors to source-drain bias, VDS, and gate voltage, Vg. Also, the effect of bulk and surface adatom in the wire cross section was evaluated.
Keywords :
Doping; Electrostatics; Logic gates; Photonic band gap; Silicon; Transistors; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration on Silicon (ULIS), 2011 12th International Conference on
Conference_Location :
Cork, Ireland
Print_ISBN :
978-1-4577-0090-3
Electronic_ISBN :
978-1-4577-0089-7
Type :
conf
DOI :
10.1109/ULIS.2011.5757976
Filename :
5757976
Link To Document :
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