DocumentCode
3021199
Title
Is entanglement dispensable in quantum lithography?
Author
Angelo, Milena D. ; Scarcelli, G. ; Shih, Yanhua
Author_Institution
Eur. Lab. for Nonlinear Spectrosc., Carrara
fYear
2007
fDate
6-11 May 2007
Firstpage
1
Lastpage
2
Abstract
Can classical light simulate the effect of quantum lithography? The analysis of the two-photon image generated both by entangled two-photon and by chaotic radiation indicates that only entanglement can double the resolution of an image.
Keywords
image resolution; photolithography; quantum entanglement; two-photon processes; chaotic radiation; image resolution; quantum entanglement; quantum lithography; two-photon image; Chaos; Image analysis; Interference; Lenses; Light sources; Lithography; Optical imaging; Physics; Quantum entanglement; Spatial resolution;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-55752-834-6
Type
conf
DOI
10.1109/CLEO.2007.4453467
Filename
4453467
Link To Document