Title :
Is entanglement dispensable in quantum lithography?
Author :
Angelo, Milena D. ; Scarcelli, G. ; Shih, Yanhua
Author_Institution :
Eur. Lab. for Nonlinear Spectrosc., Carrara
Abstract :
Can classical light simulate the effect of quantum lithography? The analysis of the two-photon image generated both by entangled two-photon and by chaotic radiation indicates that only entanglement can double the resolution of an image.
Keywords :
image resolution; photolithography; quantum entanglement; two-photon processes; chaotic radiation; image resolution; quantum entanglement; quantum lithography; two-photon image; Chaos; Image analysis; Interference; Lenses; Light sources; Lithography; Optical imaging; Physics; Quantum entanglement; Spatial resolution;
Conference_Titel :
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/CLEO.2007.4453467
