DocumentCode :
3022957
Title :
Emission Intensity Improvement of InGaN Ultraviolet Light-Emitting Diodes Grown on Wet-Etched Sapphire Substrates
Author :
Pan, Chang-Chi ; Hsieh, Chi-Hsun ; Chyi, Jen-Inn
Author_Institution :
Nat. Central Univ., Jhongli
fYear :
2007
fDate :
6-11 May 2007
Firstpage :
1
Lastpage :
2
Abstract :
Wet-etched pattern sapphire substrates (PSS) with stripes along the <11-20>sapphire direction are fabricated and investigated. Dislocation reduction and light extraction enhancement are observed for the material grown these substrates. 400 nm UV LEDs with output power enhancement as much as 87% have been demonstrated on the substrate with a 0.9 mum etching depth. The enhancement of output power is thus attributed to the reduction of dislocation density as well as increased light extraction efficiency by the stripe-PSS.
Keywords :
III-V semiconductors; dislocation density; etching; gallium compounds; indium compounds; light emitting diodes; sapphire; ultraviolet detectors; wide band gap semiconductors; Al2O3; InGaN; UV LED; dislocation density reduction; emission intensity; light extraction efficiency enhancement; size 0.9 mum; ultraviolet light-emitting diodes; wavelength 400 nm; wet-etched pattern sapphire substrate fabrication; Dry etching; Epitaxial growth; Gallium nitride; Light emitting diodes; Optical pumping; Optical sensors; Power generation; Stimulated emission; Substrates; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-834-6
Type :
conf
DOI :
10.1109/CLEO.2007.4453549
Filename :
4453549
Link To Document :
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