Effect of oxygen ratio to the transparency and conductivity of nanostructured ZnO thin films deposited by RF magnetron sputtering

Author

Sin, N.D.M. ; Ahmad, Sahar ; Musa, M.Z. ; Mamat, M.H. ; Aziz, Aznita Abdul ; Rusop, M.

Author_Institution

NANO-Electron. Centre, Univ. Teknol. MARA, Shah Alam, Malaysia

fYear

2012

fDate

19-21 Sept. 2012

Firstpage

34

Lastpage

37

Abstract

The effect of oxygen ratio to the transparency and conductivity of nanostructured ZnO thin films deposited by RF magnetron sputtering are investigated. The effect of oxygen ratio at (0~10 sccm) on the ZnO thin films have been investigated. The I-V measurement specify that at ratio 45: 5 sccm (Ar:O₂) show the highest conductivity. All films have show high highly transparent in the visible region which (>;80 %). The average transmittance in the visible range is 350 nm-1200 nm. The image of nanocolumnar size increase as the insertion of oxygen ratio increase.

Keywords

electric current measurement; nanostructured materials; oxygen; semiconductor thin films; sputtering; transparency; voltage measurement; zinc compounds; I-V measurement; RF magnetron sputtering; ZnO; conductivity; nanocolumnar size increase; nanostructured thin films; oxygen ratio; transparency; Conductivity; Optical films; Radio frequency; Sputtering; Substrates; Zinc oxide; ZnO thin films; electrical properties; optical properties; oxygen flow rate; structural properties;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Electronics (ICSE), 2012 10th IEEE International Conference on

Conference_Location

Kuala Lumpur

Print_ISBN

978-1-4673-2395-6

Electronic_ISBN

978-1-4673-2394-9

Type

conf

DOI

10.1109/SMElec.2012.6417085

Filename

6417085