• DocumentCode
    3025651
  • Title

    Single chip CMUT arrays with integrated CMOS electronics: Fabrication process development and experimental results

  • Author

    Zahorian, Jaime ; Guldiken, Rasim ; Gurun, Gokce ; Qureshi, Muhammad Shakeel ; Balantekin, Mujdat ; Hasler, Paul ; Degertekin, F. Levent

  • Author_Institution
    Woodruff Sch. of Mech. Eng., Georgia Inst. of Technol., Atlanta, GA
  • fYear
    2008
  • fDate
    2-5 Nov. 2008
  • Firstpage
    386
  • Lastpage
    389
  • Abstract
    One of the most important promises of capacitive micromachined ultrasonic transducer (CMUT) technology is integration with electronics. This approach maximizes transducer sensitivity by minimizing parasitic capacitances and ultimately improves the signal to noise ratio. Additionally, due to physical size limitations required for catheter based imaging devices, optimization of area occurs when the CMUTs are fabricated directly above the associated electronics. Here, we describe successful fabrication of CMUTs on custom designed CMOS electronics from a commercial IC foundry. This is achieved by modifying a low temperature micromachining process by adding one additional mask and developing a sloped wall dry etching step on isolation oxide layer for metal interconnect. Experiments show that both the CMUT and the integrated CMOS electronics are functional, resulting combination generating pulse-echo response suitable for ultrasound imaging.
  • Keywords
    CMOS integrated circuits; capacitive sensors; etching; integrated circuit interconnections; micromachining; microsensors; ultrasonic imaging; ultrasonic transducer arrays; area optimization; capacitive micromachined ultrasonic transducer; catheter based imaging device; fabrication process development; integrated CMOS electronics; isolation oxide layer; low temperature micromachining process; mask; metal interconnect; parasitic capacitance; physical size limitation; pulse-echo response; signal-to-noise ratio; single chip CMUT array; sloped wall dry etching; transducer sensitivity; ultrasound imaging; CMOS image sensors; CMOS integrated circuits; CMOS process; CMOS technology; Catheters; Fabrication; Parasitic capacitance; Signal to noise ratio; Ultrasonic imaging; Ultrasonic transducers; CMOS; CMUT; IVUS; fabrication; micromachined;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium, 2008. IUS 2008. IEEE
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2428-3
  • Electronic_ISBN
    978-1-4244-2480-1
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2008.0095
  • Filename
    4803575