Title :
Single chip CMUT arrays with integrated CMOS electronics: Fabrication process development and experimental results
Author :
Zahorian, Jaime ; Guldiken, Rasim ; Gurun, Gokce ; Qureshi, Muhammad Shakeel ; Balantekin, Mujdat ; Hasler, Paul ; Degertekin, F. Levent
Author_Institution :
Woodruff Sch. of Mech. Eng., Georgia Inst. of Technol., Atlanta, GA
Abstract :
One of the most important promises of capacitive micromachined ultrasonic transducer (CMUT) technology is integration with electronics. This approach maximizes transducer sensitivity by minimizing parasitic capacitances and ultimately improves the signal to noise ratio. Additionally, due to physical size limitations required for catheter based imaging devices, optimization of area occurs when the CMUTs are fabricated directly above the associated electronics. Here, we describe successful fabrication of CMUTs on custom designed CMOS electronics from a commercial IC foundry. This is achieved by modifying a low temperature micromachining process by adding one additional mask and developing a sloped wall dry etching step on isolation oxide layer for metal interconnect. Experiments show that both the CMUT and the integrated CMOS electronics are functional, resulting combination generating pulse-echo response suitable for ultrasound imaging.
Keywords :
CMOS integrated circuits; capacitive sensors; etching; integrated circuit interconnections; micromachining; microsensors; ultrasonic imaging; ultrasonic transducer arrays; area optimization; capacitive micromachined ultrasonic transducer; catheter based imaging device; fabrication process development; integrated CMOS electronics; isolation oxide layer; low temperature micromachining process; mask; metal interconnect; parasitic capacitance; physical size limitation; pulse-echo response; signal-to-noise ratio; single chip CMUT array; sloped wall dry etching; transducer sensitivity; ultrasound imaging; CMOS image sensors; CMOS integrated circuits; CMOS process; CMOS technology; Catheters; Fabrication; Parasitic capacitance; Signal to noise ratio; Ultrasonic imaging; Ultrasonic transducers; CMOS; CMUT; IVUS; fabrication; micromachined;
Conference_Titel :
Ultrasonics Symposium, 2008. IUS 2008. IEEE
Conference_Location :
Beijing
Print_ISBN :
978-1-4244-2428-3
Electronic_ISBN :
978-1-4244-2480-1
DOI :
10.1109/ULTSYM.2008.0095