DocumentCode :
3026249
Title :
Development and application of in-house high voltage power supply for atmospheric pressure plasma treatment system
Author :
Nayan, Nafarizal ; Zahariman, M.R. ; Ahmad, M.F.B. ; Ali, R.A.M. ; Sahdan, Mohd Zainizan ; Hashim, U.
Author_Institution :
Microelectron. & Nanoelectronic - Shamsuddin Res. Centre (MiNT-SRC), Univ. Tun Hussein Onn Malaysia, Parit Raja, Malaysia
fYear :
2012
fDate :
19-21 Sept. 2012
Firstpage :
596
Lastpage :
599
Abstract :
Atmospheric pressure plasma is now being widely developed for simple surface treatment process and for fast medical tools sterilization. Plasma surface modification involves the interaction of the plasma generated excited species with a solid interface or coatings. The previous vacuum plasma system is not applicable and very costly. In the present project, we have developed the high voltage power supply and atmospheric pressure plasma using dielectric barrier discharge concept. The high voltage power supply was developed using a simple 555 timer and car´s ignition coil. Then, we investigate the plasma surface modification effect from the contact angle measurement and evaluate the roughness using surface profiler. We found that the contact angle decreased with the exposure time and surface roughness changed when exposed with atmospheric pressure plasma. It has been understood that a film coating will be create on glass and silicon surface when expose with atmospheric pressure plasma system in water vapor environment.
Keywords :
angular measurement; atmospheric pressure; contact angle; plasma applications; 555 timer; atmospheric pressure plasma treatment system; car ignition coil; contact angle measurement; dielectric barrier discharge concept; fast medical tools sterilization; film coating; glass surface; in-house high voltage power supply; plasma surface modification effect; silicon surface; solid coatings; solid interface; surface profiler; surface roughness; surface treatment process; time roughness; water vapor environment; Glass; Plasmas; Rough surfaces; Substrates; Surface discharges; Surface roughness; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Electronics (ICSE), 2012 10th IEEE International Conference on
Conference_Location :
Kuala Lumpur
Print_ISBN :
978-1-4673-2395-6
Electronic_ISBN :
978-1-4673-2394-9
Type :
conf
DOI :
10.1109/SMElec.2012.6417216
Filename :
6417216
Link To Document :
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