DocumentCode
3026471
Title
Lifetime mapping of Si wafers by an infrared camera [for solar cell production]
Author
Bail, Michael ; Kentsch, Jörg ; Brendel, Rolf ; Schulz, Max
Author_Institution
ZAE Bayern, Erlangen, Germany
fYear
2000
fDate
2000
Firstpage
99
Lastpage
103
Abstract
The authors present a fast and contact-free method to map the effective minority carrier lifetime τeff of silicon solar cell wafers at a high spatial resolution. An infrared camera measures the infrared light absorbtion induced by optically excited free carriers. A single camera measurement yields a map of the areal density of excess minority carriers which the authors convert into a map of the effective minority carrier lifetime τeff. The infrared measurement results agree with the results of established techniques, such as microwave detected photoconductance decay and quasi steady state photoconductance lifetime measurements. The novel infrared lifetime mapping technique is sufficiently fast for in-line process control
Keywords
carrier density; carrier lifetime; elemental semiconductors; infrared imaging; light absorption; minority carriers; optical variables measurement; semiconductor device measurement; semiconductor device testing; silicon; solar cells; Si; Si solar cell wafers; effective minority carrier lifetime; excess minority carrier density; high spatial resolution; in-line process control; infrared lifetime mapping technique; infrared light absorbtion measurement; optically excited free carriers; solar cell production; Area measurement; Cameras; Charge carrier lifetime; Density measurement; Infrared detectors; Microwave measurements; Photoconductivity; Photovoltaic cells; Silicon; Spatial resolution;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2000. Conference Record of the Twenty-Eighth IEEE
Conference_Location
Anchorage, AK
ISSN
0160-8371
Print_ISBN
0-7803-5772-8
Type
conf
DOI
10.1109/PVSC.2000.915763
Filename
915763
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