• DocumentCode
    3026788
  • Title

    Capacitive micro-sensor for the detection of dextrose

  • Author

    Humayun, Q. ; Hashim, U. ; Kashif, Mhair

  • Author_Institution
    Nano Struct. Lab.-On-Chip Res. Group, Univ. Malaysia Perlis (UniMap), Kangar, Malaysia
  • fYear
    2012
  • fDate
    19-21 Sept. 2012
  • Firstpage
    716
  • Lastpage
    719
  • Abstract
    This work demonstrates the fabrication and electrical characterization of aluminum micro-gap on silicon substrate. For low cost and time conventional photolithography technique has been applied to fabricate the aluminum micro-gap. The fabricated device was tested for different molarities of dextrose. For the micro-gap fabrication chrome mask was design using AutoCAD software. The size of the fabricated micro-gap was around 81.7μm. The electrical measurements were carried out using Alpha high frequency dielectric analyzer. It was observed that when the dextrose concentration varied from 250μM to 1μM the capacitance value fluctuates from 330nF to 10nF. The limit of detection for the fabricated device was 1μM.
  • Keywords
    CAD; aluminium; capacitive sensors; electronic engineering computing; elemental semiconductors; masks; microsensors; photolithography; silicon; Al; Alpha high frequency dielectric analyzer; AutoCAD software; Si; capacitance 330 nF to 10 nF; capacitive microsensor; dextrose concentration; electrical measurements; microgap fabrication chrome mask; photolithography technique; Aluminum; Capacitance; Fabrication; Lithography; Sensor phenomena and characterization; Silicon; capacitance; chrome mask; dextrose; micro-gap; molarities;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Electronics (ICSE), 2012 10th IEEE International Conference on
  • Conference_Location
    Kuala Lumpur
  • Print_ISBN
    978-1-4673-2395-6
  • Electronic_ISBN
    978-1-4673-2394-9
  • Type

    conf

  • DOI
    10.1109/SMElec.2012.6417243
  • Filename
    6417243