Title :
High power EUVL source demonstration of tin-doped droplet laser plasma generated by industrial solid state lasers
Author :
Takenoshita, K. ; Schmid, T. ; George, S.A. ; Cunado, J. ; Richardson, M.C. ; Fulford, B. ; Hendarson, I. ; Hay, N. ; Ellwi, S.
Author_Institution :
Univ. of Central Florida, Orlando
Abstract :
High EUV source power has been demonstrated with a laser-plasma source exhibiting low debris and high conversion efficiency. This offers a viable path towards successful realization of EUV lithography for the next generation semiconductor devices.
Keywords :
plasma sources; solid lasers; ultraviolet lithography; extreme UV lithography source; industrial solid state lasers; laser-plasma source; semiconductor devices; tin-doped droplet laser plasma; Plasma applications; Plasma density; Plasma devices; Plasma sources; Plasma waves; Plasma x-ray sources; Power generation; Power lasers; Solid lasers; Ultraviolet sources;
Conference_Titel :
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/CLEO.2007.4453741
